instrument / attribute | value | available for users | comments |
---|---|---|---|
Energy range | 10-1000eV | Yes | 6 BL configurations: 10-50eV, 27-125eV, 50-120eV, 95-520eV, 200-675eV, 400-850eV, 650-1100eV |
Energy resolving power | >10^4 | Yes | |
Photon flux | >10^12 Ph/s | ||
Polarizations | LH, LV, Cp, Cm | Yes | LH and LV in the whole energy range, Cp and Cm in 10-650eV range (only with 1st ID harmonic) |
Beam size | ~15µm(H) x 10µm(V) in whlole energy range | Yes | Incidence angle for normal emission=55deg, beam spot on sample= ~26µm(H) x 10µm(V). Vertical size depends on BL exit slit aperture |
ALBA Synchrotron
instrument / attribute | value | available for users | comments |
---|---|---|---|
Sample temperature during measurement | 7K - 300K | Yes | |
Sample height | 0mm - 4mm | Height with respect to sample holder surface | |
Sample size | Max size: 5mm x 5mm | For samples fixed with clamps. Larger samples are possible if glued, see sample holder drawings | |
Sample motions in measurement posiiton | X=±5mm ,Y=±2mm, Z=±7mm, Polar=-25deg to +40deg, Azimuth= -80deg to +80deg, Tilt= -15deg to +30 deg | ||
Sample position control | Microscope with spatial resolution = 10µm, beam position reference | ||
Sample preparation | Cleave in analysis chamber | Yes | Either with kapton tape or with top-post |
Sputtering-annealing | Yes | In preparation chamber (Ar+ sputtering, T up to 1200K) | |
Annealing | Yes | In organic chamber T up to 700K | |
Annealing in O2 atmosphere | Yes | In organic chamber T up to 700K, P up to 10^-4mbar | |
O2 plasma | Yes | In organic chamber | |
Thin film evaporation (various elements or compounds) | Yes | In preparation and organic chamber | |
Li evaporation | Yes | In preparation chamber @ RT or LN2 temperature // On measurement manipulator @ LHe temperature | |
Other alkali getters | Yes | Rb and K in preparation chamber @ RT and LN2 temperature | |
ALD | Commissioning | Ask BL staff for details | |
Sample characterization | LEED (with Auger spectroscopy) | Yes | In preparation chamber @ RT |
mini-LEED | Yes | On measurement manipulator @ LHe temperature | |
Sample holders | ox-free Cu, Ta, W, V, Mo | Yes | Cu sample holders not heatable |
Operando environment | Sample holder with 4 electrical contacts | Yes | For sample gating during ARPES or in-situ 4 contacts transport characterization |
Sample loading and storage | 6 samples in load lock + 12 samples in storage chamber | Yes | |
Transfer from UHV suitcase | Through storage chamber | Yes | For UHV specification contact the BL staff |
instrument / attribute | value | available for users | comments |
---|---|---|---|
ARPES analyser type | 220mm hemispherical analyser with horizontal slit. Motorised slit motion in X and Y directions. | ||
ARPES analyser energy range | 10eV - 650eV 2D angle resolved (with mechanical deflector) | Yes | |
10eV -900eV angle resolved (fixed deflector) | Yes | ||
ARPES analyser energy resolution | |||
ARPES analyser angular modes | ±3.5deg, ±7deg, ±15deg, ±17deg (magnified) | ||
ARPES analyser spatial mode | ±2.5mm | Used for analyser focus and beam position adjustment | |
ARPES analyser slit apertures | |||
Data format ARPES | .nxs, .krx, .dat | Yes | .nxs main data format, see file tree see Au(111) @ 415eV measurement IgorPro procedures available for .krx data loading |
Software for online visualization/analisys | Silx view, NavARP | ||
Spin-ARPES analyser type | VLEED with 1 Fe-O target, 2 magnetization directions | ||
Spin-ARPES energy range | 10eV - 500eV | Yes | with PE=10eV, 20eV, 30eV, 40eV |
Spin-ARPES spin components | 6 components (+X, -X, +Y, -Y, +Z, -Z) | Yes with restrictions | Either with 2 different target magnetization or with spin manipulator |
Spin-ARPES energy and angular resolution | |||
Absorption with TEY | 10eV - 1000eV | Momentarily not available | Sample drain current |
Absoprtion with PEY | 50eV - 1000eV | Yes | With electron analyser, either CIS or CKE |
Resonant Photoemission | 50eV - 900eV | Yes | |
Data format spin-ARPES | .krx, .dat | Yes | IgorPro procedures available for data visualization and analysis |